Sensors
US10144987B2 · kind B2 · utility
0Cited by
6References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 9, 2016 |
| Grant date | Dec 4, 2018 |
| Priority date | — |
| Expiry date | Aug 22, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC21D2211/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Embodiments of the present invention provide an electromagnetic sensor (400) for detecting a microstructure of a metal target, comprising: a magnetic device (410, 420) for providing an excitation magnetic field; a magnetometer (430) for detecting a resultant magnetic field induced in a metal target; and a calibration circuit (450, 551, 552, 553, 554) for generating a calibration magnetic field for calibrating the electromagnetic sensor, wherein the calibration reference magnetic field is generated by an electrical current induced in the calibration circuit by the excitation magnetic field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.