Method and apparatus for forming coating layer with nano multi-layer
US10145001B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 6, 2016 |
| Grant date | Dec 4, 2018 |
| Priority date | — |
| Expiry date | Mar 19, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F15/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is a method and apparatus for forming a coating layer using a physical vapor deposition apparatus equipped with a sputtering apparatus and an arc ion plating apparatus, comprising: a first coating step of forming a Mo coating layer on a base material using a the sputtering apparatus and a Mo target and Ar gas; a nitrating step of forming a nitride film forming condition using an arc ion plating apparatus and Ar gas and N2 gas; a second coating step of forming a nano composite coating layer of Cr—Mo—N using the Mo target and Ar gas of the sputtering apparatus and the Ar gas, N2 gas and a Cr source of the arc ion plating apparatus at the same time; and a multi-coating step of forming a multi-layer having alternating Cr—Mo—N nano composite coating layers and Mo coating layers by revolving the base material around a central pivot.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.