Exposure method of holographic grating and exposure light path

US10146179B2 · kind B2 · utility

Assignee

• Graduate School at Shenzhen, Tsinghua University · CN

Inventors

• Qian Zhou · Beijing, CN
• Kai Ni · Sammamish, US
• Rui Tian · Wuxi, CN
• Jinchao Pang · Tangxia, CN
• Mingfei Xu · Nanhu, CN
• Hao Dong · Santa Clara, US
• Jinchao ZHANG · Longbeilingcun, CN

Key dates

• Filing date: Jul 8, 2016
• Grant date: Dec 4, 2018
• Expiry date: Feb 2, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G03H2001/0439
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention provides an exposure method of a holographic grating and an exposure light path. The exposure method includes: (1) determining initial positions (C, D) of the two exposure light sources (S1, S2); (2) calculating imaging quality parameters of the grating; (3) setting a compensating mirror (A1) in the initial light path; (4) adjusting a position of the exposure light source (S1) to a new position (D1) according to a position of the compensating mirror (A1); (5) calculating imaging quality parameters of the grating; (6) judging whether the imaging quality parameters in the step (5) and the imaging quality parameters in the step (2) are equal, and if yes, using the new position (D1) as a final position of the exposure light source (S1). The exposure method and exposure light path may effectively solve a problem of a much too close distance between exposure light sources.