Array substrate, method for manufacturing the same and display device
US10147644B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 29, 2016 |
| Grant date | Dec 4, 2018 |
| Priority date | — |
| Expiry date | Sep 29, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG09G2300/0408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An array substrate and a method for manufacturing the same, and a display device are provided. The method includes: forming a thin film transistor (TFT) structure of a display region and a TFT structure of the GOA region on a substrate; sequentially forming a first insulating layer, an indium tin oxide (ITO) layer and a photoresist layer on the TFT structure; exposing and developing the photoresist layer using a halftone mask plate, and etching the ITO layer, to form an electrode layer in the GOA region and an electrode layer in the display region; and ashing the remaining photoresist to completely remove the photoresist on the electrode layer in the display region and to thinning the photoresist on the electrode layer in the GOA region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.