Vapor transport deposition method and system for material co-deposition
US10147838B2 · kind B2 · utility
1Cited by
24References
20Claims
0Family size
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Key dates
| Filing date | Oct 11, 2016 |
| Grant date | Dec 4, 2018 |
| Priority date | — |
| Expiry date | Oct 11, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An improved feeder system and method for continuous vapor transport deposition that includes at least two vaporizers coupled to a common distributor through an improved seal for separately vaporizing and collecting at least any two vaporizable materials for deposition as a material layer on a substrate. Multiple vaporizers provide redundancy and allow for continuous deposition during vaporizer maintenance and repair.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.