Method for manufacturing photo cured material
US10150231B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 23, 2013 |
| Grant date | Dec 11, 2018 |
| Priority date | — |
| Expiry date | Jan 16, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2995/0027
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Provided is a method for manufacturing a photo cured material, by which transferring precision can be improved and a small surface roughness can be obtained. The method includes the steps of: placing a photo-curable composition on a substrate; brining a mold into contact with the photo-curable composition; irradiating the photo-curable composition with light; and releasing the mold from the photo-curable composition. The contact is performed in a condensable gas atmosphere, the condensable gas condensing under a temperature condition at the contact and under a pressure condition that the condensable gas receives when the photo-curable composition intrudes gaps between the substrate and the mold or concavities provided on the mold, and the photo-curable composition includes a gas dissolution inhibitor having a rate of weight change with reference to the condensable gas that is −1.0% to 3.0%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.