Liquid discharge head, manufacturing method therefor, and recording method
US10150292B2 · kind B2 · utility
1Cited by
1References
17Claims
0Family size
Assignee
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Key dates
| Filing date | May 23, 2017 |
| Grant date | Dec 11, 2018 |
| Priority date | — |
| Expiry date | May 23, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2002/14467
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A liquid discharge head comprising a silicon substrate; an insulating layer A formed on a first surface of the silicon substrate, a protective layer A that includes metal oxide and is formed on the insulating layer A, the structure that is formed on the protective layer A by direct contact with the protective layer A, includes organic resin, and forms a part of a flow path for liquid, and an element that is formed on a second surface of the silicon substrate on a side opposite to the first surface, and is configured to generate energy used for discharging the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.