Photonic device for ultraviolet and visible wavelength range
US10151879B2 · kind B2 · utility
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2References
14Claims
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Key dates
| Filing date | Mar 24, 2017 |
| Grant date | Dec 11, 2018 |
| Priority date | — |
| Expiry date | Mar 24, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12138
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In one aspect, a photonic device includes a substrate layer comprising magnesium fluoride and an optical guiding layer disposed on the substrate layer. The optical guide layer includes silicon dioxide. The substrate layer and the optical guide layer are transparent at an ultraviolet and visible wavelength range. In another aspect, a method includes oxidizing silicon to form a silicon dioxide layer, bonding the silicon dioxide layer to magnesium fluoride, removing the silicon and performing lithography and etching of the silicon dioxide to form a photonic device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.