Apparatus for monitoring gas and plasma process equipment including the same
US10153141B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 13, 2015 |
| Grant date | Dec 11, 2018 |
| Priority date | — |
| Expiry date | Feb 13, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/6417
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided is an apparatus for monitoring a gas and plasma process equipment including the same. The apparatus includes: a housing including a gas inflow hole, a gas discharge hole, and windows; a light source disposed adjacent to one of the windows outside the housing to provide source light to a gas supplied between the gas inflow hole and the gas discharge hole; a sensor disposed adjacent to the other of the windows outside the housing to detect fluorescence emitted from the gas by the source light; and a coil disposed in the housing between the gas inflow hole and the gas discharge hole to heat and decompose the gas between the light source and the sensor, thereby increasing the fluorescence emitted from the gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.