Semiconductor apparatus and washing method
US10155252B2 · kind B2 · utility
2Cited by
4References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 30, 2015 |
| Grant date | Dec 18, 2018 |
| Priority date | — |
| Expiry date | Sep 16, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B3/02
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A semiconductor apparatus is provided. The semiconductor apparatus includes a wafer carrier, and a cup surrounding the wafer carrier. The semiconductor apparatus also includes a bottom washing device located between the wafer carrier and the cup, and configured to spray washing liquid onto the cup. Therefore, the cup can be washed by the bottom washing device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.