Patent · US Active

Preparation method of doped vanadium dioxide powder

US10167223B2 · kind B2 · utility

0Cited by
4References
10Claims
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Inventors

Key dates

Filing dateApr 27, 2015
Grant dateJan 1, 2019
Priority date
Expiry dateAug 18, 2036

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/2982
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

The present invention relates to a hydrothermal method for preparing a doped vanadium dioxide powder, the doped powder having a chemical composition of V1-XMXO2, 0<X≤0.5, and M is a doping element, which is introduced to control a particle size and a morphology of the doped powder, the doping element M is selected from a group consisting of manganese, iron, cobalt, nickel, copper, zinc, tin, indium, antimony, gallium, germanium, lead and bismuth, the method comprising a step of a precursor treatment of titrating a quadrivalent vanadium aqueous solution with a basic reagent to obtain a precursor suspension, wherein the precursor treatment involves titrating the quadrivalent vanadium aqueous solution until the emergence of the precursor suspension. The preparation methods for the present invention are easy to implement, low in cost, provide high yield, and are suitable for large scale production.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.