Process for the reductive amination of halogen-containing substrates
US10173961B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 4, 2015 |
| Grant date | Jan 8, 2019 |
| Priority date | — |
| Expiry date | Nov 4, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C249/04
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Disclosed is a process for performing a reductive amination of a first functional group in an organic feed substrate, which feed substrate comprises at least one further functional group containing a halogen atom, wherein the halogen atom is selected from the list consisting of chlorine, bromine, iodine, and combinations thereof, in the presence of hydrogen and a heterogeneous catalyst comprising at least one metal from the list of Pd, Pt, Rh, Ir, and Ru, and in absence of any catalytic amount of any second metal from the list consisting of Ag, Ni, Co, Sn, Bi, Cu, Au, and combinations thereof. The process is preferably applied for the reductive amination of 2-chloro-benzaldehyde to form 2-chloro-benzyldimethylamine, as an intermediate in the production of active agrochemical compounds and microbicides of the methoximinophenylglyoxylic ester series.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.