Pattern configurable reticle
US10175031B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 30, 2017 |
| Grant date | Jan 8, 2019 |
| Priority date | — |
| Expiry date | May 30, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0189
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A system, method, and device for configuring an optical aiming device for ballistic drop compensation (BDC). The optical aiming device can include a housing with a reticle pane defining a reticle display field viewable by a user and indicating a zero point, the housing further including a plurality of axially spaced lenses and defining an optical path therethrough. In various embodiments the system includes a display device configured to project an image generated from a display, a processor, and a non-transitory computer readable storage medium. The computer readable data storage medium can include instructions executable by the processor to receive a first set of ballistics input data indicating a first type of ammunition, determine a BDC pattern including at least two holdover marks corresponding to at least two ranges for the first type of ammunition, and project the BDC pattern onto the reticle display field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.