Wafer level electrical probe system with multiple wavelength and intensity illumination capability system
US10175266B1 · kind B1 · utility
1Cited by
8References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2015 |
| Grant date | Jan 8, 2019 |
| Priority date | — |
| Expiry date | Mar 14, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/309
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A wafer level electrical probe system with multiple wavelength and intensity illumination capability system that enables concurrent reliability studies of illumination stimulation, electrical stimulation, and the interplay of both electrical and illumination stimulation. The probe system includes five sub-systems: a controllable wavelength and intensity illumination input sub-system with two different configurations; a wafer level electrical probe sub-system; an illumination intensity calibration sub-system; an illumination delivery sub-system; and an illumination wavelength calibration sub-system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.