Redundant Power Supply System for a plasma process
US10176970B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 7, 2017 |
| Grant date | Jan 8, 2019 |
| Priority date | — |
| Expiry date | Aug 7, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY04S20/248
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A power supply system for a plasma process includes two separate power supplies of essentially identical performance characteristics, including a first power supply and a second power supply, and a data transfer connection operably coupling the two power supplies for data communication between the two power supplies. The first power supply is configured to: receive, in a standby mode, data via the data transfer connection from the second power supply supplying power to a plasma process in a normal operating mode, and supply, in an active backup mode, power to the plasma process in place of the second power supply, as a function of the received data. The first power supply can supply in the active backup mode to the plasma process the power having one or more characteristics that are substantially the same as those of the power provided by the second power supply in the normal operating mode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.