Ion source for soft electron ionization and related systems and methods
US10176977B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Nov 24, 2015 |
| Grant date | Jan 8, 2019 |
| Priority date | — |
| Expiry date | Aug 3, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/147
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion source is configured for soft electron ionization and produces a low electron-energy, yet high-intensity, electron beam. The ion source includes an electron source that produces the electron beam and transmits it into an ionization chamber. The electron beam interacts with sample material in the ionization chamber to produce an ion beam that may be transmitted to a downstream device. The electron source is configured for generating a virtual cathode upstream of the ionization chamber, which enhances the intensity of the electron beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.