Substrate treating apparatus and substrate transporting method
US10181417B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 11, 2015 |
| Grant date | Jan 15, 2019 |
| Priority date | — |
| Expiry date | Jul 11, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67754
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate transport mechanism receives two substrates from an upstream ID section using two arms of three arms. The substrate transport mechanism delivers one of the two substrates to and from an individual processing unit of a processing block using one of arms holding the one of the two substrates to be subjected to a given process by the processing block and one of the arms holding no substrate. The substrate transport mechanism then keeps holding the other substrate with the remaining one arm of the arms having received the substrates while the processing unit processes the substrate. The substrate transport mechanism transfers the two substrates to a downstream processing block using the one arm holding the substrate subjected to the given process by the processing block and the one arm holding the other substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.