Patent · US Active

Submicron sized silicon powder with low oxygen content

US10181600B2 · kind B2 · utility

1Cited by

2References

17Claims

0Family size

Assignee

UMICORE · BE

Inventors

Jean Scoyer · Herentals, BE
Stijn Put · Olmen, BE
Daniël Nelis · Olen, BE
Kris Driesen · Olen, BE

Key dates

Filing date	Jun 22, 2011
Grant date	Jan 15, 2019
Priority date	—
Expiry date	Nov 2, 2034

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02E60/10
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A submicron sized Si based powder having an average primary particle size between 20 nm and 200 nm, wherein the powder has a surface layer comprising SiOx, with 0<x<2, the surface layer having an average thickness between 0.5 nm and 10 nm, and wherein the powder has a total oxygen content equal or less than 3% by weight at room temperature. The method for making the powder comprises a step where a Si precursor is vaporized in a gas stream at high temperature, after which the gas stream is quenched to obtain Si particles, and the Si particles are quenched at low temperature in an oxygen containing gas.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.