Curable composition for photoimprint, cured product, and method of producing film having pattern, optical component, circuit board, or electronic component using the composition
US10182500B2 · kind B2 · utility
1Cited by
1References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 10, 2015 |
| Grant date | Jan 15, 2019 |
| Priority date | — |
| Expiry date | Jun 30, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/4913
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
In an imprint process in a gaseous atmosphere containing a condensable gas, the curable composition for photoimprint is difficult to cure, the pattern is not fully formed to cause defects. The present invention relates to a curable composition for photoimprint in a gaseous atmosphere containing a condensable gas. The curable composition for photoimprint at least comprises the following component (A) and component (B): Component (B) has a saturated solubility of less than 1% by weight in the condensable gas in a liquid state at 5° C. and 1 atm or has a Hansen distance (Ra) of larger than 7.6 to the condensable gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.