Substrate cleaning device
US10183315B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 15, 2013 |
| Grant date | Jan 22, 2019 |
| Priority date | — |
| Expiry date | Jul 5, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B3/022
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate cleaning device includes: a housing having a cleaning chamber therein; a plurality of spray pipelines pivotally mounted at the housing and distributed side by side along a moving direction of a substrate, each of the spray pipelines is provided with several spray ports configured to direct liquid in the spray pipeline towards a surface to be cleaned of the substrate, and one end of each of the spray pipelines is provided with a transmission gear coaxially fixed thereto; a driving system (4) coupled with the transmission gear and thus configured to drive the spray pipeline, through the transmission gear, to rotate reciprocally at the same frequency, wherein a portion of spray pipelines have a reciprocal rotation direction opposite to that of the other portion of spray pipelines. This substrate cleaning device enables a better cleaning effect for the substrate surface with minimum influence on the traveling speed of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.