Silicon-based hardmask

US10186424B2 · kind B2 · utility

Assignee

• Rohm and Haas Electronic Materials LLC · US

Inventors

• Suzanne M. Coley · Mansfield, US
• Paul J. LaBeaume · Auburn, US
• Shintaro Yamada · Shrewsbury, US
• Cecilia W. Kiarie · Marlborough, US
• Li Cui · Westborough, US
• Bhooshan Popere · Berkeley, US

Key dates

• Filing date: Jun 14, 2017
• Grant date: Jan 22, 2019
• Expiry date: Jun 14, 2037

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08G77/80
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from these compositions can be easily removed during processing without the need for a separate removal step.