Method and apparatus for fixation measurement and refraction error measurement using wave-front error
US10188293B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | May 8, 2017 |
| Grant date | Jan 29, 2019 |
| Priority date | — |
| Expiry date | May 8, 2037 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B3/0025
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method and apparatus for fixation measurement includes projecting, by an image projector, a stimulus onto one or more eyes of a patient via a beam splitter, and capturing, by one or more image sensing devices disposed conjugate to the one or more eyes, a reflected image including light reflected from the one or more eyes in response to the stimulus, the reflected image including information indicating the fixation of the one or more eyes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.