Patent · US Active

Waveguide fabrication method

US10191215B2 · kind B2 · utility

8Cited by

7References

21Claims

0Family size

Assignee

ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) · CH

Inventors

Tobias Kippenberg · Lausanne, CH
Martin Pfeiffer · Winnenden, DE
Arne Kordts · Crissier, CH

Key dates

Filing date	May 4, 2016
Grant date	Jan 29, 2019
Priority date	—
Expiry date	May 4, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG02F2203/56
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A waveguide fabrication method including the steps of providing a substrate including at least one waveguide recess structure and a stress release recess structure for receiving a waveguide material, and depositing the waveguide material onto the substrate and into both the waveguide recess structure and the stress release recess structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.