Patent · US Active

Mask and method of fabricating display device using the mask

US10191331B2 · kind B2 · utility

0Cited by
0References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 26, 2018
Grant dateJan 29, 2019
Priority date
Expiry dateJun 26, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70216
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A mask includes a base substrate, and a light shielding pattern including a light transmitting portion and a light shielding portion on the base substrate, wherein the light shielding portion includes a third source electrode portion, a third drain electrode portion spaced apart from the third source electrode portion and including at least a portion parallel to the third source electrode portion, a first auxiliary light shielding portion at an end portion of the third source electrode portion facing the third drain electrode portion, and a second auxiliary light shielding portion at an end portion of the third drain electrode portion facing the third source electrode portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.