Machine system and associated method for optical endpoint control optimization
US10191463B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2016 |
| Grant date | Jan 29, 2019 |
| Priority date | — |
| Expiry date | May 4, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/39033
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
Provided is a machine system having optical endpoint control and associated method for maintaining having is provided constant optical contact. Specifically, the machine system comprises a machine capable of movement in at least one direction. The machine is configured such that, during a calibration phase, a steerable retroreflective system is mounted upon the machine for movement therewith. A controller is configured to control the movement of the machine in at least one direction. The machine system may be configured to automatically adjust the feedrate of the machine, upon determining that a velocity required for the positioner to move the retroreflector to a desired position exceeds a certain segment feedrate threshold, such that an incident beam of light can maintain constant contact with the retroreflector throughout movement of the machine from the first position to the second position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.