Patent · US Active

Plasma vapor deposited (PVD) coating process

US10196739B2 · kind B2 · utility

1Cited by
16References
20Claims
0Family size

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Key dates

Filing dateNov 10, 2016
Grant dateFeb 5, 2019
Priority date
Expiry dateSep 1, 2037

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31663
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A plasma vapor deposited (PVD) coating method. The method includes overlaying a primer polymer layer onto a substrate surface. The method further includes overlaying a chrome metallic layer onto the primer polymer. The method also includes depositing a plasma vapor deposited (PVD) oxide layer of a thickness of 1 to 5 nanometers onto the chrome metallic layer and having a parameter of color change of the underlying chrome metallic layer. The color change may be determined according to the following equation: ΔE*ab=√{square root over ((ΔL*)2+(Δa*)2+(Δb*)2)} L is the color brightness of the oxide layer, and a and b are the color-component dimensions of the oxide and metallic layers. ΔE*ab may be less than 2.3. The method further includes overlaying an exposed polymeric layer onto the PVD oxide layer to form a protective layer at the interface between the exposed polymeric layer and the oxide layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.