System, method, and apparatus for aftertreatment system monitoring
US10196955B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 8, 2016 |
| Grant date | Feb 5, 2019 |
| Priority date | — |
| Expiry date | Dec 7, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/40
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
A method includes determining whether a urea refill event is detected, and clearing a quality accumulator value and clearing a latching abort command. The method includes determining whether urea fluid quality check abort conditions are met, and clearing the urea quality accumulator, latching the abort command, and exiting the reductant fluid quality check. In response to the abort conditions not being met, incrementing the urea quality accumulator according to an amount of urea being injected, and comparing the accumulated urea quantity to a low test threshold. The method includes, in response to the accumulated urea quantity being greater than the low test threshold, comparing the accumulated urea quantity to a high test threshold, and in response to the urea quantity being greater than the high test threshold, determining whether the a NOx exceedance is observed and clearing a urea quality error in response to the NOx exceedance not being observed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.