Quantum dot, composition comprising same, and method of manufacturing quantum dot
US10197820B2 · kind B2 · utility
3Cited by
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15Claims
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Key dates
| Filing date | Dec 4, 2015 |
| Grant date | Feb 5, 2019 |
| Priority date | — |
| Expiry date | Dec 4, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/01791
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Provided are quantum dots passivated by oligomers or polymers which are formed by a reaction of a first monomer having at least three thiol groups (—SH) at the terminal end with a second monomer having at least two functional groups at the terminal end that can react with the thiol groups, and a spacer group between the at least two functional groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.