Manufacturing method of color filter substrate and manufacturing method of liquid crystal panel
US10197845B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 24, 2017 |
| Grant date | Feb 5, 2019 |
| Priority date | — |
| Expiry date | Jun 8, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13398
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a manufacturing method of a color filter substrate, comprising: providing a first substrate, and the first substrate comprising pixel unit regions and a light blocking region located between the pixel unit regions, coating a photoresist material on the first substrate, and exposing the pixel unit regions to form monochromatic blocks, and partially exposing the light blocking region to form color blocks; coating a black photoresist material in the light blocking region, and the black photoresist material covering the color blocks; exposing the black photoresist material and the black photoresist material located in the light blocking region forming a black matrix and the black photoresist material covering the color blocks forming spacers. The black photoresist material, of which the color blocks are used to be the substrate, form spacers, and the black photoresist material in the rest part of the light blocking region forms a black matrix.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.