Shadow elimination arrangement, touch screen and method for producing the same
US10198134B2 · kind B2 · utility
2Cited by
1References
18Claims
0Family size
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Key dates
| Filing date | Jul 24, 2015 |
| Grant date | Feb 5, 2019 |
| Priority date | — |
| Expiry date | Mar 13, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2203/04103
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present application provide a shadow elimination arrangement, a touch screen and a method for producing the same. The shadow elimination arrangement for a pattern of an ITO layer includes a silicon oxynitride layer, on which the pattern of the ITO layer is provided, being provided on a transparent substrate; and a silicon dioxide layer, provided over the pattern of the ITO layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.