Simulated annealing to place annotations in a drawing
US10198412B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 9, 2016 |
| Grant date | Feb 5, 2019 |
| Priority date | — |
| Expiry date | Jul 28, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2210/12
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method, system, and computer program product provide the ability to optimize placement of annotations in a drawing model. A drawing model that has annotations and objects is acquired. An annotation (to be moved) is randomly selected. A new position for the selected annotation is randomly selected. The selected annotation is moved to the new position. A new quality score of a resulting drawing model is computed. The resulting drawing model is accepted or rejected based on the new quality score. The above steps are iterated, wherein over time, a probability of accepting the resulting drawing model based on a worse new quality score decreases. The final resulting drawing model is output (e.g., for display).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.