Cobalt, iron, boron, and/or nickel alloy-containing articles and methods for making same
US10199203B2 · kind B2 · utility
1Cited by
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17Claims
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Key dates
| Filing date | May 13, 2016 |
| Grant date | Feb 5, 2019 |
| Priority date | — |
| Expiry date | Dec 31, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3322
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X═B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.