Lens design method and radiation source substrate
US10199740B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 18, 2015 |
| Grant date | Feb 5, 2019 |
| Priority date | — |
| Expiry date | Mar 18, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01Q19/065
- WIPO fieldTelecommunications
- WIPO sectorElectrical engineering
Abstract
A lens design method is disclosed for designing a lens to reshape an actual far-field radiation pattern of a radiation source, such as a spiral antenna, to a preferred far-field radiation pattern. The method comprises:—determining a preferred far-field radiation pattern of the radiation source;—deriving a corresponding near-field radiation pattern from the preferred far-field radiation pattern;—determining an actual near-field pattern of the radiation source;—mapping an electric field and a magnetic field of the actual near-field radiation pattern to the derived near-field radiation pattern using a transfer relationship, the transfer relationship comprising material parameters which characterize the lens; and,—determining the material parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.