Method of forming a spectral selective coating
US10201947B2 · kind B2 · utility
2Cited by
0References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2015 |
| Grant date | Feb 12, 2019 |
| Priority date | — |
| Expiry date | Apr 23, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming a spectral selective coating is disclosed. The method may include providing particles on a substrate, wherein the particles include submicron particles. The method may farther include sintering the particles under atmospheric pressure to form a sintered layer an the substrate and texturing the sintered layer to provide a submicron surface roughness height on the sintered layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.