Method of manufacturing oxide crystal thin film
US10202685B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 11, 2013 |
| Grant date | Feb 12, 2019 |
| Priority date | — |
| Expiry date | Nov 11, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02628
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
There is provided a thin film manufacturing method which allows both a reduction in the carbon impurity concentration and a high film forming speed, as well as allows separate formation of stable crystal structures. There is provided a method for manufacturing an oxide crystal thin film. The method includes carrying raw material fine particles to a film forming chamber by means of a carrier gas, the raw material fine particles being formed from a raw material solution including water and at least one of a gallium compound and an indium compound, and forming an oxide crystal thin film on a sample on which films are to be formed, the sample being placed in the film forming chamber. At least one of the gallium compound and the indium compound is bromide or iodide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.