Method of producing optoelectronic semiconductor components, and optoelectronic semiconductor component
US10205071B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 2016 |
| Grant date | Feb 12, 2019 |
| Priority date | — |
| Expiry date | May 19, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/0365
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of producing optoelectronic semiconductor components includes providing a carrier with a carrier underside and a carrier top. The carrier has a metallic core material and at least on the carrier top a metal layer. A dielectric mirror is applied to the core material. At least two holes are formed through the carrier. A ceramic layer with a thickness of at most 150 μm at least on the carrier underside and in the holes is produced. The ceramic layer includes the core material as a component. Metallic contact layers are applied to at least subregions of the ceramic layer on the carrier underside and in the holes so that the carrier top electrically connects to the carrier underside through the holes. At least one radiation-emitting semiconductor chip is applied to the carrier top and the semiconductor chip is electronically bonded to the contact layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.