Process for limiting the emissions of gases from porous particles
US10207251B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2016 |
| Grant date | Feb 19, 2019 |
| Priority date | — |
| Expiry date | Dec 28, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2235/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process is disclosed for limiting the emissions of gases from a porous material in the form of particles comprising a porous inorganic support and at least 0.1% by weight of one or more compounds chosen from organic compounds, halogen compounds, boron compounds and phosphorus compounds. The particles are placed in motion within a hot gas stream traversing them, and a liquid composition containing one or more film-forming polymer(s) is sprayed over the moving particles by means of a twin-fluid atomization nozzle, in which the liquid composition is mixed with a pressurized gas, with a relative atomization pressure of greater than or equal to 0.7×1005 Pa, until a protective layer containing the film-forming polymer(s) and exhibiting a mean thickness of less than or equal to 20 μm is obtained on the surface of the said particles. A material resulting from this process is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.