Parallel laser manufacturing system and method
US10207365B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 12, 2015 |
| Grant date | Feb 19, 2019 |
| Priority date | — |
| Expiry date | Sep 5, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0833
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A laser manufacturing system capable of fabricating 3-D resolved 2-D patterns. The system includes a pulse laser source generating a laser beam; a reflectance mirror arranged in the propagation path of the laser to reflect the laser, the mirror being controllable to adjust an emergent angle of the laser; a deformable dispersion unit located in the laser receiving path from the reflectance mirror and having an array of micromirrors controllable in response to the adjusted emergent angle to form required laser patterns from the reflected laser, the laser patterns having spatially separated optical spectral components with multiple propagation angles; and one or more focusing optical components positioned in the propagation path of the separated optical spectral components produced by the deformable dispersion unit; the focusing components recombine the optical spectral components at fabrication targets with patterns defined by the deformable dispersion unit. The laser pulse duration is shortest on or inside the fabrication target along the laser propagation path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.