Method for supplying gas for plasma based analytical instrument
US10211038B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 27, 2017 |
| Grant date | Feb 19, 2019 |
| Priority date | — |
| Expiry date | Mar 26, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/105
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
To achieve an effective gas filtering in a plasma spectrometric apparatus using a gas of a comparatively high consumption flow rate, and to improve the analytical ability, there is provided a plasma spectrometric apparatus containing a sample introducer for producing and delivering an injector gas containing an analyte sample, a plasma generator for generating plasma into which the injector gas is introduced, and an analyzer disposed subsequent to the plasma generator for analyzing the analyte sample. The plasma spectrometric apparatus contains a first gas line for supplying gas to the sample introducer, a second gas line for supplying gas to the plasma generator, and a filter located in the first gas line for removing impurities contained in the gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.