Polysiloxane films and methods of making polysiloxane films
US10212825B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Mar 3, 2016 |
| Grant date | Feb 19, 2019 |
| Priority date | — |
| Expiry date | Mar 3, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G77/80
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming a polysiloxane film on a substrate comprises polymerizing a siloxane monomer in a reaction chamber containing the substrate. The polymerization is catalyzed by a 30-60 W radio frequency plasma, the pressure in the reaction chamber during the polymerization is 100-400 mTorr, the residence time of the siloxane monomer in the reaction chamber is 5-120 minutes, the siloxane monomer is heated to 30-200° C. before entering the reaction chamber, and the polymerization is carried out at a temperature of 30-100° C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.