Plasma generating method including generating first plasma without supplying first gas in liquid and generating second plasma in first gas, and plasma generating apparatus
US10220107B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 21, 2017 |
| Grant date | Mar 5, 2019 |
| Priority date | — |
| Expiry date | Jun 2, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2305/023
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
A plasma generating method, used in a plasma generating apparatus which includes a container, a first electrode, and a second electrode, includes: supplying a liquid in the container so that the second electrode is in contact with the liquid; in a first period, generating first plasma in a bubble generated in the liquid by applying a first voltage between the first electrode and the second electrode; supplying a first gas in the liquid in a second period after the first period; and generating second plasma in the first gas by applying a second voltage between the first electrode and the second electrode. In generating the first plasma, the first gas is not supplied in the liquid. The bubble contains a second gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.