Acid generator compounds and photoresists comprising same
US10221131B2 · kind B2 · utility
4Cited by
5References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 27, 2016 |
| Grant date | Mar 5, 2019 |
| Priority date | — |
| Expiry date | May 27, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.