Patent · US Active

Method and device for improving the SAFT analysis when measuring irregularities

US10222352B2 · kind B2 · utility

0Cited by

8References

22Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventor

Hubert Mooshofer · Birkenfeld, DE

Key dates

Filing date	Oct 23, 2013
Grant date	Mar 5, 2019
Priority date	—
Expiry date	May 23, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG01N2291/044
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The invention relates to a method and to a corresponding device in which irregularities regarding each detected measurement position within a measurement surface are detected using a local measurement density. Each echo signal received in response to each detected measurement position is then weighted in order to generate an image using a data processing device such that the irregularities are adjusted.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.