Input device and method of manufacturing it
US10222915B2 · kind B2 · utility
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1References
23Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 15, 2016 |
| Grant date | Mar 5, 2019 |
| Priority date | — |
| Expiry date | Feb 1, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2203/04103
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
First electrode layers are formed from an ITO layer on one surface of a substrate formed from a PET film. The surfaces of the first electrode layers are covered with an insulating layer formed from a dry film resist or the like. Second electrode layers are formed on the surface of the insulating layer in a printing process. The second electrode layer is formed from conductive nanowires or conductive nanotubes. After that, first wiring layers brought into conduction with the first wiring layers and second wiring layers brought into conduction with the second electrode layers are formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.