Organotin oxide hydroxide patterning compositions, precursors, and patterning

US10228618B2 · kind B2 · utility

Assignee

• Inpria Corporation · US

Inventors

• Stephen T. Meyers · Corvallis, US
• Jeremy T. Anderson · Corvallis, US
• Brian J. Cardineau · Corvallis, US
• Joseph B. Edson · Corvallis, US
• Kai-Li Jiang · Beijing, CN
• Douglas A. Keszler · Corvallis, US
• Alan J. Telecky · Albany, US

Key dates

• Filing date: Oct 12, 2016
• Grant date: Mar 12, 2019
• Expiry date: Oct 18, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/40
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.