Patent · US Active

Static disk electrode for electroplating bath analysis

US10234419B2 · kind B2 · utility

0Cited by

7References

11Claims

0Family size

Assignee

Hong Kong Applied Science and Technology Research Institute Company Limited · CN

Inventors

Yaofeng Sun · Sha Tin, CN
Sha Xu · Sha Tin, CN

Key dates

Filing date	May 23, 2016
Grant date	Mar 19, 2019
Priority date	—
Expiry date	Feb 11, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG01N27/28
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The presently claimed invention provides an electrochemical analytical apparatus for electrochemical bath analysis. The apparatus comprise a static electrode and a rotatable unit. As steady liquid flow can be generated on the electrolytic surface of the static electrode by the rotatable unit through rotation, the static disk electrode does not involve any movement during the bath analysis such that the design of the electrical contact in the electrode can be substantially simplified.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.