Patent · US Active

Method for producing alkyl-indium compounds and the use thereof

US10239892B2 · kind B2 · utility

0Cited by
11References
16Claims
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Assignee

Inventors

Key dates

Filing dateMar 16, 2017
Grant dateMar 26, 2019
Priority date
Expiry dateMar 16, 2037

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07F5/00
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

The invention relates to a method for the cost-effective and environmentally friendly production of alkyl indium sesquichloride in high yield and with high selectivity and purity. The alkyl indium sesquichloride produced according to the invention is particularly suitable, also as a result of the high purity and yield, for the production, on demand, of indium-containing precursors in high yield and with high selectivity and purity. As a result of the high purity, the indium-containing precursors that can be produced are particularly suitable for metal organic chemical vapor deposition (MOCVD) or metal organic vapor phase epitaxy (MOVPE). The novel method according to the invention is characterized by the improved execution of the method, in particular a rapid process control. Owing to targeted and extensive use of raw materials that are cost-effective and have a low environmental impact, the method is also suitable for use on an industrial scale.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.