Thin film total internal reflection diffraction grating for single polarization or dual polarization

US10241244B2 · kind B2 · utility

Assignee

• Lumentum Operations LLC · US

Inventors

• John Michael Miller · Saline, US
• Gonzalo Wills · Ottawa, CA
• Lu Tian · Plano, US
• Michael O'Leary · San Jose, US

Key dates

• Filing date: Jul 29, 2016
• Grant date: Mar 26, 2019
• Expiry date: Jul 29, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B27/4261
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer.