Laser pulse delay system and laser annealing system
US10241339B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2016 |
| Grant date | Mar 26, 2019 |
| Priority date | — |
| Expiry date | Mar 25, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/10
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure discloses a laser pulse delay system and a laser annealing system. The laser pulse delay system comprises: a beam splitter, a first reflective unit and a delay unit. The beam splitter is configured to split a laser beam emitted by a laser into a first beam and a second beam, such that the first beam is transmitted to the first reflective unit and the second beam is transmitted to the delay unit. The first reflective unit is configured to reflect the first beam it receives, such that the reflected first beam is transmitted to a component to be irradiated. The delay unit is configured to delay the second beam it receives, such that the delayed second beam is transmitted to the component to be irradiated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.