Patent · US Active

Arrangement for spatially limiting a reservoir for a marker material

US10242949B2 · kind B2 · utility

0Cited by

7References

20Claims

0Family size

Assignee

OSRAM Opto Semiconductors GmbH · DE

Inventors

Christian Kurz · Riegelsberg, DE
Sven Gerhard · Alteglofsheim, DE
Andreas Löffler · Neutraubling, DE
Jens Müller · Regensburg, DE

Key dates

Filing date	Apr 14, 2016
Grant date	Mar 26, 2019
Priority date	—
Expiry date	Apr 16, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2223/5448
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

An arrangement includes a confining layer, a metallization layer and a semiconductor component, wherein the metallization layer is arranged on the semiconductor component, and the confining layer is arranged on the metallization layer, the confining layer spatially establishes a reservoir for the marker material at least partially in a defined manner, the confining layer and the metallization layer include an identical material, and the marker material is arranged in the reservoir of the arrangement.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.